Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER)
This STTR seeks innovative hard-mask materials that enable precise, high-aspect-ratio semiconductor fabrication for defense microsystems like 3D circuits and RF filters. Solutions should deliver superior etch resistance and minimal line-edge roughness while addressing current masks' stress, degradation, and pattern-distortion limitations.